is a leading supplier of advanced metrology instrumentation and software for the surface science and thin-film technology industries. Founded in 1992 out of the University of Michigan Applied Physics department, our products are used for monitoring wafer temperature, thin film stress, deposition rate, thickness, material absorptive properties, and Reflection High Energy Electron Diffraction (RHEED
). Backed by a commitment to ongoing support, these solutions are currently used worldwide in research and production line monitoring of compound semiconductor-based electronic, optoelectronic, and photovoltaic devices. Extensive input and close collaboration with our worldwide customer base has lead to the development of today’s most powerful thin film characterization products. We pride ourselves on the ability to listen carefully, deliver a valuable product, and exceed expectations for technical support.
