18/08/2026
When preparing wafers for the next process step, effective drying after wet cleaning or etching is critical. The wafer surface must be pristine and free of particles, metals, and organic contamination.
Before IPA is vaporized and carried into a Marangoni dryer, it should pass through tight filtration. Filtration alone does not always provide the consistent, high-quality drying results needed to keep wafer surfaces free of particle adders and watermark-like defects.
Cobetter’s Chemdeion series purifiers help address these potential issues by removing particles and volatile metals using a surface-modified PTFE membrane. To learn more, contact your local Banner Industries office for additional information.